Description
Dynamic Range: >10¹² Linear with Automatic Cross Calibration
Unit Size: Each
Almost all elements present in a solid sample can be detected and quantified routinely: many down to the parts per billion (ppb) level. High productivity and low cost of analysisThe Element GD Plus GD-MS is designed to deliver outstanding sensitivity and accuracy at a high sample throughput, dramatically lowering the cost of your analysis.
• Fast-flow ion source
• User-friendly source design: < 1 min sample exchange
• Short pumping times: < 10 min sample turnaround
• High sample throughput: up to 5 samples/hr
• Less sample preparation: no requirement for acid cleaning of high-purity samples
• Faster sample analysis: no requirement to measure calibration standards Routine operationThe Element GD Plus GD-MS is designed with routine operation and high throughput at its core.
• Linear dynamic range spanning more than 12 orders of magnitude allows the simultaneous analysis of matrix elements (%), traces (ppm), and ultra-traces (ppb)
• Automatic cross-calibration between different detection modes ensures robust results
• Sample vacuum chamber: eliminates risk of leakage between the sample and the GD cell
• Determine elemental concentrations rapidly within a single scan without calibration standards (using standard RSF approach)
• Best precision within a short analysis time Outstanding limits of detectionThe Element GD Plus GD-MS delivers high throughput without compromise. With the highest signal-to-noise ratio and lowest limits of detection, the Element GD Plus GD-MS is the workhorse for ultra-high purity elemental analysis.
• Unique ion source designed for high ion transmission, maximizing the signal analyzed.
• Guaranteed signal-to-noise ratio produces the sub-ppb limits of detection
• Optional CNO option achieves sub-ppm level limits of detection for CNO with no compromise to the through-put of your analysis
• Factor 10 reduction of polyatomic interferences compared to static GD sources Trust in results by high mass resolutionThe simplicity of high-resolution ICP-MS allows the most advanced performance, without compromising on straightforward and reliable method development.
• Interference-free measurements for indisputable analytical results
• Any combination of resolution settings can be performed within a single analysis
• Fixed-slit design guarantees maximum stability and reproducibility
• Minimum contribution of high matrix signals on neighboring analyte peaks due to filter lens Depth profiling with nanometer resolutionDepth profiling is an important tool for elemental analysis of coatings and the assessment of element diffusion across layers.
• Depth resolution from nanometers to hundreds of micrometers
• Determining concentrations of all elements from sub-ppm to 100% without the need for calibration
• Flexible anode diameter for advanced depth profiling a
• Sputter rates can be adjusted for bulk analysis or depth profiling Recommended for:
• Aerospace: nickel superalloys, composite materials, depth profiling of coatings and diffusion layers
• Microelectronics: copper, alumina powder, sputter targets
• Renewable energy: silicon blocks, wafers, solar cells
• Medical/pharmaceutical/food: stainless steel, alloys
