Merck, Z561703-1EA, PlasmaFlo gas flow mixer and pressure monitor

General description
The PlasmaFlo may be used with the High Power Expanded, Expanded, or Basic Plasma Cleaner (115V) and is beneficial for gas mixing, more precise quantitative control of the gas flowrate and monitoring of vacuum pressure.

• Dual gas inputs into flowmeters with 49 mL/min maximum flowrate* and ±2% accuracy
• Thermocouple vacuum gauge and digital meter (1 to 1999 mTorr)
• Inputs/Output connection: ¼ in. Swagelok to ¼ in. O.D. stainless steel hose adaptor

* Maximum flowrate varies with process gas and regulated pressure. Correlated flowrate tables are available for the most common process gases (Air, Ar, N2, O2) used with our Plasma Cleaners and metered at 10 psig. Flowrate tables for other process gases and regulated pressures can be made available. Please inquire with Harrick Plasma.
Use with the Expanded or Basic Plasma Cleaner for fine control of up to 2 process gases, process gas mixing, and monitoring of chamber pressure.

• Dual gas inputs
• Flowmeter 1: 49 mL/min maximum flowrate *
• Flowmeter 2: 104 mL/min maximum flowrate *
• ±2% accuracy
• Thermocouple vacuum gauge and digital meter (1 to 1999 mTorr)
• Input/Output connection: 1/4 in. Swagelok to 1/4 in. O.D. stainless steel hose adapter

* Maximum flowrate varies with process gas and regulated pressure. Correlated flowrate tables are available for the most common process gases (Air, Ar, N2, O2) used with our Plasma Cleaners and metered at 10 psig. Flowrate tables for other process gases and regulated pressures can be made available.