Merck, NIST2134, Arsenic implant in silicon depth profile standard

General description
Each unit of SRM 2134 contains a single crystal silicon substrate, measuring 1 cm by 1 cm, which is ion-implanted with the isotope ⁷⁵ As at an approximate energy of 100 keV.

SRM 2134_cert

SRM 2134_SDS
Application
The SRM is used to calibrate the secondary ion response to detect the minor and trace levels of arsenic within a silicon matrix using the analytical technique of secondary ion mass spectrometry (SIMS).
Features and Benefits
Available with a certificate documenting NIST-certified value for retained dose of ⁷⁵As atoms and the dose is expressed in units of arsenic mass per unit area.
The reference and information values of elements are reported as mass fraction.
Certified values are retained dose of ⁷⁵As atoms, and the dose is expressed in units of arsenic mass per unit area.
The NIST certificate is provided with expiration certificate, use, storage, handling, and maintenance instructions.

Other Notes
Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Arsenic (⁷⁵As)

See certificate for values and more details at nist.gov/SRM.
Legal Information
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